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To date, many MEMS devices are not satisfactory due to their durability and friction resistance due to the silicon material used; nowadays, due to the emergence of ultra-nanocrystalline films, it is expected to be solved. For example, if the gears in the micromotor are made of silicon, some machining can be performed because the speed must be close to 400,000 revolutions per minute. Within a few minutes, the gears will lose their effect due to wear.
The ultra-nanocrystalline film is produced by Argonne's patented chemical vapor deposition (CVD) method. The film exhibits a separate diamond structure with a thickness of approximately 100 to 300 nm and a coefficient of friction as low as 0.01. The CVD process is a process in which an fullerence sphere (a spherical molecule composed of 60 pure carbon atoms) is cracked into a diatomic carbon molecule (dimer) in an argon plasma.
Subsequent studies of other methods at Argonne have achieved the same effect. It introduces methane in an argon plasma and produces the same film if no or little hydrogen is present. For example, fine diamond powder is prepared in advance on a silicon wafer to form a spherical plasma to surround the wafer or other material. When the carbon dimer is formed on a wafer in a plasma, these carbon dimers form crystals having a diameter of about 3 to 5 nm and are automatically arranged into a film.
Researchers at the National Laboratory (Argonne, Ill.) have successfully developed a diamond film named Super Nanocrystalline Film. This thin film technology is expected to greatly accelerate the development of MEMS (Micro Electro Mechanical Systems) technology. This film introduces the excellent mechanical properties, friction properties, and thermal properties (excellent hardness, wear resistance, and extremely low coefficient of friction) of diamonds into the rapidly evolving MEMS field.